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11, HTC 11, 5656 AE Eindhoven, Netherlands
Eindhoven
Netherlands
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Scale: 11-50
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9 months agoSCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL).
SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment down to 1 μm.
We help customers with optimized equipment, consumable materials and processes for high volume production. Our solutions enable manufacturers of optics and photonic products to increase performance, lower end-product costs and increase functionality.
Nanoimprinting, Nanophotonics, and Substrate Conformal Imprint Lithography
High-resolution patterning at the nanoscale level. Providing tools, consumables and process development services].
Corporate | Type | Tweets | Articles | |
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Intel Corporation IT services, Semiconductors, Semiconductor Manufacturing | Intel Corporation IT services, Semiconductors, Semiconductor Manufacturing | Other 23 Apr 2024 | | |
Philips Electricals, Hospitals and Health Care | Philips Electricals, Hospitals and Health Care | Other 31 Dec 2023 | | |
SPIE, the international society for optics and photonics Research, Non-profit Organizations | SPIE, the international society for optics and photonics Research, Non-profit Organizations | Other 31 Jan 2024 | |